国際学会

２０２０年

2件

  • Hiromu Takemi, Akira Kawai,
    "Local condensation of TMAH developer at photoresist/glass interface analyzed by using confocal laser scanningmicroscope (CLSM)",
    SPIE Proceedings, Advanced Lithography, 2020,SanJose, [11326-56]
  • Keita Hasegawa, Akira Kawai,
    "Adhesion Improvement of Photoresist; Destraction Mod Analysis",
    SPIE Proceedings, Advanced Lithography, 2020,SanJose, [11326-60]
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２０１７年

3件

  • Katsuaki Yamane and Akira Kawai,
    "Fabrication of Double Cone Tube Formed by Micro Stereolithography for Molding of Three-Dimensional Metal Structure",
    The 6th International GIGAKU Conference in Nagaoka (IGCN 2017), Japan, RD-037 (2017)
  • Katsuaki Yamane and Akira Kawai,
    "Application to Artificial Skin of Double Cone Tube Made of Acrylic Resin Formed by Micro Stereolithography",
    The 34th International Conference of Photopolymer Science and Technology (ICPST-34), Makuhari, Chiba, Japan, A-66 (2017)
  • Hodaka Shirataki, Akira Kawai,
    "Durability of Resist Film in TMAH Developer Analyzed by C-V Method",
    International Conference of Science of Technology Innovation 2017 (STI-Gigaku 2017), Nagaoka, Japan, STI-9-91 (2017)
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２０１６年

15件

  • Tomohiro Maruyama, Akira Kawai,
    "Formation of Ultra Thin Continuous Resist Film Less Than 10nm",
    The 5th International GIGAKU Conference in Nagaoka (IGCN 2016), Japan, P-24 (2016)
  • Katsuaki Yamane, Akira Kawai,
    "Biomimetic Fabrication of Gas Storage System in Micro Two Step Cone Tube",
    The 5th International GIGAKU Conference in Nagaoka (IGCN 2016), Japan, P-23 (2016)
  • Natsumi Yagi, Akira Kawai,
    "Smooth Fluid Flow at Micro Channel/Tube Junction",
    The 5th International GIGAKU Conference in Nagaoka (IGCN 2016), Japan, P-18 (2016)
  • *, Akira Kawai,
    "Application of Micro Heating System to Plant Vital Control",
    The 5th International GIGAKU Conference in Nagaoka (IGCN 2016), Japan, P-17 (2016)
  • Hodaka Shirataki, Akira Kawai,
    "Analysis of TMAH Developer Intrusion into Resist Film by C-V Curve of MIS Capacitor",
    The 5th International GIGAKU Conference in Nagaoka (IGCN 2016), Japan, P-15 (2016)
  • Katsuaki Yamane, Tomohiro Maruyama, Yosuke Sakurai, Akira Kawai,
    "Development of Micro Cone Shape Tube Utilizing for Gas Trap Sysytem",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Thu-C11-223 (2016)
  • Akira Kawai, Hodaka Shirataki, Hiroki Sasazaki, Shogo Ohtani,
    "Dielectric Dispersion Analysis of Resist Materials by Parallel Plate Capacitor Structure",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Thu-C7-211 (2016)
  • Akira Kawai, Hodaka Shirataki, *, Natsumi Yagi, Katsuaki Yamane, Tomohiro Maruyama,
    "Characterization of Nanoscale Bubble and Polymer Aggregate Adhered on Substrate by using Atomic Force Microscope (AFM) Tip",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Wed-C2-165 (2016)
  • Tomohiro Maruyama, Katsuaki Yamane, Hiroki Nakano, Akira Kawai,
    "Characterization of SAN (Self-Assembled Network) Structure Formed in Ultra Thin Film by using AFM (atomic force microscope)",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Wed-C2-164 (2016)
  • Akira Kawai, Katsuaki Yamane, Masaya Shinozaki, Yosuke Sakurai,
    "Fuel Cell Operation in Liquid Environment by Gas-Liquid Interface Control System",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Wed-C2-162 (2016)
  • Natsumi Yagi, *, Tomotaka Ariga, Hotaka Endo, Akira Kawai,
    "Bubble Trap Analysis for Smooth Fluid Flowing in Micro Channel / Tube Network",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Wed-C2-161 (2016)
  • *, Natsumi Yagi, Yuta Noguchi, Akira Kawai,
    "Combination of Micro-Heater and Water Channel Device and Its Application to Plant Cell Vital Control",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Wed-C2-160 (2016)
  • Akira Kawai, Tomohiro Maruyama, Hiroki Nakano,
    "Negative Pattern Formation in Positive Resist Layer by EB / UV Hybrid Lithography",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, Tue-A1-11 (2016)
  • Hodaka Shirataki, Akira Kawai,
    "TMAH Developer Intrusion into Resist Film Analyzed by C-V Method of MIS Structure",
    42nd Micro and Nano Engineering (MNE2016), Vienna, Austria, C7-1-6 (2016)
  • Hiroki Nakano, Kenta Takahashi, Akira Kawai,
    "Negative pattern formation in positive resist layer by EB / UV hybrid lithography",
    ICPST-32, Makuhari, Chiba (2016)
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２０１５年

5件

  • Hodaka Shirataki, Akira Kawai,
    "C-V characteristic of Ta2O5 sputtered thin film of 17nm thickness",
    The 4th International GIGAKU Conference in Nagaoka (IGCN 2015), Japan, MP-26, Abstract P240 (2015).
  • Hiroki Nakano, Akira Kawai,
    "Nano-Scale Self-Aligned Structure Formed on Ionic Conductive Film: Perfluorosulfonic Acid (PFSA)",
    The 4th International GIGAKU Conference in Nagaoka (IGCN 2015), Japan, IP-19, Abstract P211 (2015).
  • Akira Kawai, Hiroki Nakano,
    "Manipulation of Nanoscale Condensed Soft Matters by using Cantilever Tip of Atomic Force Microscope (AFM)",
    The 4th International GIGAKU Conference in Nagaoka (IGCN 2015), Japan, IP-1, Abstract P194 (2015).
  • Akira Kawai, Hiroki Nakano,
    "Peeling Analysis of Nanoscale Condensed Matters by using Cantilever Tip of Atomic Force Microscope (AFM)",
    The 5th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO 2015) Niigata, Japan, P3-33, P259 (2015).
  • Hiroki Nakano, Akira Kawai,
    "Formation Mechanism of Nano-Scale Self-Aligned Structure of Perfluorosulfonic Acid (PFSA) Analyzed by Surface Energy Balance Model",
    The 5th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO 2015) Niigata, Japan, P1-1, P57 (2015).
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２０１４年

8件

  • Yako Kunii and Akira Kawai,
    "Precise Nanoimprint Processes Optimized by Surface Energy Model",
    27th International Microprocesses and Nanotechnology Conference (MNC 2014) Fukuoka, Japan
  • Hiroki Nakano and Akira Kawai,
    "Functional Pattern formation on I-line Resist Film by Hybrid Lithography Utilizing Electron Beam and I-line Optical Sources",
    27th International Microprocesses and Nanotechnology Conference (MNC 2014) Fukuoka, Japan
  • Yako Kunii, Akira Kawai,
    "Effective Control of Tactile Sense in Human Finger by Micro Pattern Arrangement",
    40th Micro and Nano Engineering (MNE2014)(2014) Lausanne, Switzerland.
  • Hiroki Nakano, Yosuke Sakurai, Akira Kawai,
    "Fabrication of Functional Membrane Electrode Assembly (MEA) by Lithography Process",
    40th Micro and Nano Engineering (MNE2014)(2014) Lausanne, Switzerland.
  • Akira Kawai, Akihiro Takano, Kenta Takahashi,
    "Removal Property of Micro Bubbles Trapped on Resist Window Pattern by Dipping Into Low Surface Tension Developer",
    40th Micro and Nano Engineering (MNE2014)(2014) Lausanne, Switzerland.
  • Akira Kawai, Yosuke Sakurai,
    "Peeling analysis of nanoscale defects by using cantilever tip of atomic force microscope (AFM)",
    PMJ (PhotoMask Japan) 2014, Digest paper 7s-12 p39, 15 April, Yokohama, Japan.
  • Yosuke Sakurai, Akira Kawai,
    "Single Chip Micro Direct Methanol Fuel Cell (SC-mDMFC)",
    The 3rd International GIGAKU Conference in Nagaoka (IGCN2014), Japan, SP-6, Abstract p211 (2014).
  • Yosuke Sakurai, Akira Kawai,
    "Functional Perflurosulfonic Acid (PFSA) Micro Pattern fabrication for Micro Fuel Cell",
    The 3rd International GIGAKU Conference in Nagaoka (IGCN2014), Japan, MP-7, Abstract p170 (2014).
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２０１３年

８件

  • Shun Kamada，Akira Kawai，
    "Surface energy analysis of Indium Tin Oxide (ITO) thin films on annealing treatment"，
    第23回電気学会東京支部新潟支所研究発表会，IEEE-07，予稿集, P73 (2013)．
  • Yosuke Sakurai, Daisuke Tanaka, Shunsuke Ohata, Akira Kawai,
    "Single chip micro direct methanol fuel cell (SC-μDMFC) fabricated by MEMS Process",
    第23回電気学会東京支部新潟支所研究発表会，IEEE-07，予稿集, P72 (2013)．
  • Yosuke Sakurai, Daisuke Tanaka, Shunsuke Ohata, Akira Kawai,
    "Photoresist/Pt Electrode/Perflurosulfonic Acid (PFSA) Multilayer Structure for Single Chip Micro Direct Methanol Fuel Cell (SC-μDMFC)",
    26th International Microprocesses and Nanotechnology Conference (MNC2013), Abstract #8P-11-128L, (2013).
  • Yosuke Sakurai, Kenta Takahashi, Akira Kawai,
    "Micro Pattern Fabrication of Perflurosulfonic Acid (PFSA) Film by CF4 RIE Process",
    26th International Microprocesses and Nanotechnology Conference (MNC2013), Abstract #8P-11-127L, (2013).
  • Kenta Takahashi, Akihiro Tanaka, Akira Kawai,
    "Removal of micro bubble tapped on resist micro pattern by dipping into low surface tension developer",
    26th International Microprocesses and Nanotechnology Conference (MNC2013), Abstract #8P-11-119L, (2013).
  • Akira Kawai,
    "Fluid control MEMS constructed with functional polymer materials",
    2nd International GIGAKU Conference in Nagaoka (IGCN2013)
  • Yosuke Sakurai, Akira Kawai,
    "Effect of Mechanical Stress on Electrolyte Film for Flexible Sheet Type Direct Methanol Fuel Cell",
    The 2nd International GIGAKU Conference in Nagaoka (2nd IGCN), Abstract P151, (2013)
  • Yuta Noguchi, Akira Kawai,
    "A SU-8 Photoresist Film as Electrical Stable Layer in Liquid Environment", MP-11, The 2nd International GIGAKU Conference in Nagaoka (2013).
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２０１２年

５件

  • Yuta Noguchi, Akira Kawai,
    "Monitoring and Modeling for Response Time of Biopotential in Plant Cells",
    The Electrochemical Society, Abstract #69, Honolulu PRiME 2012.
  • Takashi Aiba, Akira Kawai,
    "Peeling Force of Polymer Micro Pattern by Direct Peeling by using AFM Tip (DPAT)",
    The Electrochemical Society, Abstract #68, Honolulu PRiME 2012.
  • Yosuke Sakurai, Akira Kawai,
    "Stress Durability of Electrolyte Structure in Flexible Sheet type Direct Methanol Fuel Cell (FS-DMFC)",
    The Electrochemical Society, Abstract #59, Honolulu PRiME 2012.
  • Akira Kawai,
    "Manipulation of Micro Condensed Matter by Direct Peeling Method by using Atomic Force Microscope Tip",
    ECS Transactions, 50 (12) 477-485 (2012)
  • Akira Kawai,
    "Condensation control of Nanoscale Polymer Aggregates by using atomic force microscope tip",
    1st International GIGAKU Conference in Nagaoka (IGCN2012), Feb. 3-5, 2012, Nagaoka, Japan, Transaction on GIGAKU,1, (2012) 01018/1-6.
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２０１１年

３件

  • Akira Kawai,
    "Nano- Porous Structure in Polymer Micro Pattern Analyzed by Atomic Force Microscopy(AFM)",　
    Nano S&T 2011, Oct. 23-26, 2011, Dalian, China. invited
  • Akira Kawai,
    "Fluid Control MEMS constructed with Polymer Materials",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2011, June. 24, 2011, Chiba, Japan. invited.
  • Akira Kawai,
    "Nanoscale Topography of Polymer Film Surface in Dry/Wet Conditions",
    Nano S&T 2011, Oct. 23-26, 2011, Dalian, China.
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２０１０年

１件

  • Masayoshi Yamada, Akira Kawai,
    "Adhesion Analysis of Resist Pattern by Applying Ultrasonic Vibration",
    第20回電気学会東京支部新潟支所研究発表会, IEEE-07, 予稿集, P27 (2010).
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２００９年

１６件

  • Shunsuke Ohata, Akira Kawai,
    "Micro bubble condensation in micro channel controlled by local electrical fi eld method",
    International Conference of SPIE Lithogtaphy Asia 2009 (Taipei, Taiwan), Proc. SPIE, vol.7520, 752034-1～11.
  • Akihiro Takano, Akira Kawai,
    "PH control of water fl owing in micro structure by local electrical field method",
    International Conference of SPIE Lithogtaphy Asia 2009 (Taipei, Taiwan), Proc. SPIE, vol.7520, 752033-1～9.
  • Akihiro Takano, Akira Kawai,
    "Durability of self-standing resist sheet composed with micro holes",
    International Conference of SPIE Lithogtaphy Asia 2009 (Taipei, Taiwan), Proc. SPIE, vol.7520, 752032-1～9.
  • Hiroki Sasazaki, Akira Kawai,
    "Micro bubble removal from micro pattern structure under alternating electric field",
    International Conference of SPIE Lithogtaphy Asia 2009 (Taipei, Taiwan), Proc. SPIE, vol.7520, 75202Z-1～11.
  • Akira Kawai, Takashi Yamaji,
    "Spontaneous deformation of resist micro pattern due to van der Waals interaction",
    International Conference of SPIE Lithogtaphy Asia 2009 (Taipei, Taiwan), Proc. SPIE, vol.7520, 75202Y-1～12.
  • Hiroki Sasazaki, Akira Kawai,
    "Relaxation properties of dielectric dipoles of photo resist materials",
    International Conference of SPIE Lithogtaphy Asia 2009 (Taipei, Taiwan), Proc. SPIE, vol.7520, 75202X-1～7.
  • K. Kato, T. Yoshida, A. Miwa, H. Shimakage, A. Kawai, H. Suematsu, K. Hamasaki,
    "Fabrication of Bi2Sr2CaCu2Ox SQUIDs by acid treatment process",
    Int. Superconductive Electronics Conf. 2009, (Fukuoka ).
  • H. Ishida, T. Kato, A. Kawai, K. Hamasaki,
    "Characterization of acide-treated product as a surrounding material of Bi2Sr2CaCu2Ox stack",
    Int. Superconductive Electronics Conf. 2009, (Fukuoka ).
  • Hiroki Sasazaki, Takahiro Kato, Akira Kawai, Katsuyoshi Hamasaki,
    "Frequency dispersion of dielectric constant of liquid nitrogen",
    ACA2009 (The third Asian Conference on Adhesion) Hamamatsu, PA29, p186-187.
  • Akira Kawai, Tomomi Nishimura, Hiroki Sasazaki,
    "Optical fringe pattern observed on condensed micro water droplets",
    ACA2009 (The third Asian Conference on Adhesion) Hamamatsu, PB29, p188-191.
  • Hiroki Sasazaki, Akira Kawai,
    "Trap control of micro bubbles on patterned wall surface",
    ACA2009 (The third Asian Conference on Adhesion) Hamamatsu, PA30, p192-193.
  • Akira Kawai, Fumi Fujitai, Akihiro Takano,
    "Nanoscale lithograph of Si surface with micro tip depending on surface adsorption water",
    ACA2009 (The third Asian Conference on Adhesion) Hamamatsu, PB28, p182-185.
  • Akihiro Takano, Akira Kawai,
    "Dissolved oxygen concentration (DOC) monitoring in deionized water by electrolysis methid",
    ACA2009 Tthe third Asian Conference on Adhesion). Hamamatsu, PA28, p180- p181.
  • Akihiro Takano, Akira Kawai,
    "Fabrication of micro-channel network composed with polymer material",
    ACA2009 Tthe third Asian Conference on Adhesion). Hamamatsu, PB27, p176-179.
  • Akihiro Takano, Akira Kawai,
    "Analysis of self-standing structure composedby thick resist layers",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2009, Chiba, Japan.
  • Junji Miyazaki, Akira Kawai,
    "Characterization of photomask substrate in optical lithography",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2009, Chiba, Japan.
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２００７年

１件

  • Akira Kawai and Kenta Suzuki
    "Bubbles condensed at resist/water interface analyzed by atomic force microscopy",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2006, Chiba, Japan (2007).
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２００６年

５件

  • Akira Kawai, Tomotaka Ariga, Shinpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada,
    "Trap mechanism of micro bubbles in micro concave patterns" ,
    SPIE ML-6153-66, SPIE 2006, International Symposium on Microlithography, San Jose, California, Proc. SPIE,　Microlithography, Advences in Resist Technology and Processing XXⅡ (2006).
  • Akira Kawai, shinpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada,
    "Solid defects condensation during watermark formation for immersion lithigraphy",
    SPIE ML6153-67 SPIE 2006, International Symposium on Microlithography, San Jose, California, Proc. SPIE,　Microlithography, Advences in Resist Technology and Processing XXⅡ (2006).
  • Akira Kawai, Hotaka Endo, Masaki Yamanaka, Atsushi Ishikawa, Kenta Suzuki,
    "Adhesion and removal of micro bubbles for immersion lithography"
    SPIE ML6135-65 SPIE 2006, International Symposium on Microlithography, San Jose, California, Proc. SPIE, Microlithography, Advences in Resist Technology and Processing XXⅡ (2006).
  • Osamu Tamada, Tomohiro Goto, Masakazu Sanada, Takahiro Moriuchi, Akira Kawai,
    "Analysis of the effect of mechanical strength of the resist film on pattern collapse behavior using atomic force microscope",
    SPIE 2006, International Symposium on Microlithography, San Jose, California, Proc. SPIE, Microlithography, Advences in Resist Technology and Processing XXⅡ (2006).
  • Mitsuru Sato and Akira Kawai,
    "Topcoat characterization for immersion lithography by fluoric acid etching on silicon substrate",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2006, Chiba, Japan (2006).
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２００５年

１２件

  • Akira Kawai, Takayoshi Niiyama, Takahiro Moriuchi,
    "Non-contacting deformation of isolated resist pattern due to interaction force analyzed by atomic force microscope",
    2005 International Microprocesses and Nanotechnology Conference (MNC2005), Tokyo, Japan, Digest of papers, 27P-7-10, P118 (2005).
  • Akira Kawai, Kenta Suzuki,
    "Effect of low surface tension liquid on pattern collapse analyzed by dynamic meniscus observation",
    2005 International Microprocesses and Nanotechnology Conference (MNC2005), Tokyo, Japan, Digest of papers, 27A-5-4, P70 (2005).
  • Takayoshi Niiyama, Akira Kawai,
    "Formation factors of watermark for immersion lithography",
    2005 International Microprocesses and Nanotechnology Conference (MNC2005), Tokyo, Japan, Digest of papers, 26A-3-4, P32 (2005).
  • Takayoshi Niiyama, Akira Kawai,
    "Micro wetting system by controlling pinning and capollary forces",
    31st International Conference on Micro- and Nano-Engineering 2005 (MNE2005), Vienna, Austria, Abstracts, 5C_03 (2005).
  • Akira Kawai, Hotaka Endo, Tomotaka Ariga,
    "Condensation mechanism of microbubbles depending on DFR pattern design",
    31st International Conference on Micro- and Nano-Engineering 2005 (MNE2005), Vienna, Austria, Abstracts, 3-l_07 (2005).
  • Akira Kawai, Takahiro Moriuchi, Takayoshi Niiyama, Takahiro Kishioka, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto,
    "Adhesion improvement of ArF resist pattern depending on BARC material",
    31st International Conference on Micro- and Nano-Engineering 2005 (MNE2005), Vienna, Austria, Abstracts, 3-a_04 (2005).
  • Akira Kawai, Kenta Suzuki,
    "Removal analysis of nano-bubbles with AFM for immersion lithography",
    31st International Conference on Micro- and Nano-Engineering 2005 (MNE2005), Vienna, Austria, Abstracts, 3-a_03 (2005).
  • Takayoshi Niiyama, Akira Kawai,
    "Interaction analysis of DI-water / Air / ArF resist system using atomic force microscope"
    International symposium on materials & processes for advanced microlithography and nanotechnology 2005, Chiba, Japan (2005).
  • Akira Kawai,
    "Condensation behavior of nanoscale bubbles on ArF excimer resist surface analyzed by atomic force microscope",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2005, Chiba, Japan (2005).
  • Osamu Tamada, Masakazu Sanada, Atsushi Ishikawa, Akira Kawai ,
    "Mechanical strength of resist film analyzed by tip indentation method",
    SPIE 2005, International Symposium on Microlithography, San Jose, California, Proc. SPIE,　Microlithography, Advences in Resist Technology and Processing XXⅡ (2005).
  • Masakazu Sanada, Osamu Tamada, Atsushi Ishikawa, Akira Kawai,
    "Analysis for collapse behavior of resist pattern in short development time process using atomic force microscope",
    SPIE 2005, International Symposium on Microlithography, San Jose, California, Proc. SPIE,　Microlithography, Advences in Resist Technology and Processing XXⅡ (2005).
  • Akira Kawai, Atsushi Ishikawa, Takayoshi Niiyama, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada,
    "Adhesion and removal behavior of nanoscale bubble on resist film surface for immersion lithography",
    SPIE 2005, International Symposium on Microlithography, San Jose, California, Proc. SPIE,　Microlithography, Advences in Resist Technology and Processing XXⅡ (2005).
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２００４年

１２件

  • Jun-ichi Koido, Akira Kawai,
    "Micro wrincles formed in multi layer structure due to stress distribution",
    Proceedings of 2004 Beijing International Bonding Technology Symposium (CSB2004), P08-1～6.
  • Akira Kawai, Hotaka Endo, Akihiro Seki
    "Adhesion analysis of adhesive layer to viscous fingering deformation",
    Proceedings of 2004 Beijing International Bonding Technology Symposium (CSB2004), P07-1～6.
  • Atsushi Ishikawa, Akira Kawai,
    "Condensation of nano-size polymer aggregates by spin drying",
    Proceedings of 2004 Beijing International Bonding Technology Symposium (CSB2004), P06-1～7.
  • Akira Kawai, Atsushi Ishikawa,
    "Thermal deformation of novolak resist pattern",
    Proceedings of 2004 Beijing International Bonding Technology Symposium (CSB2004), P05-1～3.
  • Hotaka Endo, Akira Kawai,(invited)
    "Micro bubbles captured by micro defect on flat substrate",
    Proceedings of 2004 Beijing International Bonding Technology Symposium (CSB2004), O38-1～5.
  • Akira Kawai,(invited)
    "Adhesion and cohesion properties of micro condensed matter analyzed by atomic force microscope (AFM)",
    Proceedings of 2004 Beijing International Bonding Technology Symposium (CSB2004), O03-1～6.
  • Akira Kawai, Masahito Hirano, Takayoshi Niiyama,
    "Analysis of drying behavior of rinse water depended on resist pattern arrangement",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2004, A-24, Chiba, Japan (2004).
  • Atsushi Ishikawa, Makoto Sakata, Akira Kawai,
    "Meniscus analysis in microgap during liquid drying process",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2004, A-23, Chiba, Japan (2004).
  • Takayoshi Niiyama, Akira Kawai,
    "Interaction force analysis of resist film surface in water vapor",
    International symposium on materials & processes for advanced microlithography and nanotechnology 2004, A-22, Chiba, Japan (2004).
  • Akira Kawai, (invited)
    "Cohesion property of resist pattern surface analyzed by tip indentation method",
    International symposium on materials & processes for advanced microlithography and nanotechnology, 2004, A-20,　Chiba, Japan (2004).
  • Masaki Yamanaka, Akira Okada, Akira Kawai,
    "Pinning Effect of Micro Liquid Drop on Geometrical Complex Substrate Composed with Different Surface Energy",
    Abstract book, p218-219, SanDiego, EIPBN 2004.
  • Akira Kawai, Hotaka Endo, Masaki Yamanaka,
    "Adhesion and Removal Control of Micro Bubbles for Immersion Lithography",
    Abstract book, p71-72, SanDiego, EIPBN 2004.
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２００３年

２件

  • Akira Kawai, (invited)
    "Cohesion property of resist micro pattern analyzed by using atomic force microscope (AFM)",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2003, Chiba, Japan (2003).
  • Naotaka Kubota, Tomohiko Hayashi, Takeshi Iwai, Hiroshi Komano, Akira Kawai,
    "Resist design using AFM analysis for ArF lithography",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2003, Chiba, Japan (2003).
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２００２年

３件

  • Akira Kawai,
    "Cohesion Property of Polymer Aggregates in Resist Pattern Analyzed by Atomic Force Microscope (AFM)",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2002, Chiba, Japan (2002).
  • Akira Kawai, Daisuke Inoue,
    "Van der Waals Interaction between Polymer Aggregates and Substrate Surface Analyzed by Atomic Force Microscope (AFM)",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2002, Chiba, Japan (2002).
  • Akira Kawai,
    "Adhesion and Cohesion Properties of Dot Resist Patterns Ranging from 84 to 364 nm Diameter Analyzed by Direct Peeling Method with Atomic Force Microscope Tip",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2002, Chiba, Japan (2002).
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２００１年

６件

  • Akira Kawai, Junko Kawakami,
    "Interaction Analysis of Silicon Surfaces Treated with Oxygen Plasma and Silane-coupling Agent",
    Frontiers of surface engineering 2001 (FSE2001), Nagoya, Japan, Abstracts, D4-19, p355 (2001).
  • Akira Kawai, Yuji Sawanaga,
    "Coulomb Force on Solid Surface Analyzed by Local Electrification Method with Micro Tip",
    Frontiers of surface engineering 2001 (FSE2001), Nagoya, Japan, Abstracts, D3-18, p266 (2001).
  • Jun-ichi Koido, Akira Kawai,
    "Stress analysis due to micro wrincles formed in surface layer of Cu-Al maltilayer system",
    Frontiers of surface engineering 2001 (FSE2001), Nagoya, Japan, Abstracts, A2-17, p123 (2001).
  • Daisuke Inoue, Akira Kawai,
    "Peeling Analysis of Resist Pattern of 170nm Width Due To Crack Formation by using Atomic Force Microscope Tip",
    Frontiers of surface engineering 2001 (FSE2001), Nagoya, Japan, Abstracts, A2-15, p121 (2001).
  • Akira Kawai, Takato Abe,
    "Direct Measurement of Resist Pattern Adhesion on the Surface with Silane-coupling Treatment by Atomic Force Microscope (AFM)",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2001, Chiba, Japan, J. Photopolymer Science and Technology, 14, 513-518 (2001).
  • Akira Kawai, Norio Moriike,
    "Adhesion and Cohesion Analysis of ArF/SOR Resist Patterns with Microtip of Atomic Force Microscope (AFM)",
    International symposium on materials & processes for advanced giga-bit-scale lithography 2001, Chiba, Japan, J. Photopolymer Science and Technology, 14, 507-512 (2001).
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２０００年

３件

  • Akira Kawai and Norio Moriike,
    "Analysis of pattern collpase of ArF excimer laser resist by direct peeling method with atomic force microscopy",
    International conference of Micro- and Nano-Engineering 2000, (MNE2000), Jena, Germany (2000). Extended abstract, In-6P, (2000).
  • Akira Kawai,
    "Collapse behavior of KrF resist line pattern analyzed with atomic force microscopy",
    Microprocesses and Nanotechnology ’00, 2000 International Microprocesses and Nanotechnology conference (MNC 2000), Tokyo, Japan (2000). Digest of papers, 12C-6-34, p224-225 (2000).
  • Hideaki Yoshida, Tadashi Nakamura, Yoshiaki Kawakami and Akira Kawai,
    "Formation of micro eaves analyzed by energy balance model at threehold of Cu film/DFR/Ni plating solution",
    Microprocesses and Nanotechnology '00, 2000 International Microprocesses and Nanotechnology conference (MNC 2000), Tokyo, Japan (2000). Digest of papers, 11C-2-25, p88-89 (2000).
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１９９９年

３件

  • Akira Kawai,
    "Wetting property of a Liquid Drop on a Geometrical Micro Substrate Composed with Different Surface Energy Materials",
    Electro Chemical Society Proceedings, vol.99-36, pp520-527, Hawaii, Meeting abstracts, No.1071 (1999).
  • Akira Kawai and Yoshihisa Kaneko,
    "Analysis of resist pattern collpase by direct peeling method with AFM tip",
    Microprocesses and Nanotechnology '99, 1999 International Microprocesses and Nanotechnology conference (MNC 99), Yokohama, Japan, Advanced program, 8A-8-4, p192-193 (1999).
  • Akira Kawai,
    "Analysis of Adhesion Behavior of Micro Resist Pattern by Direct Collapse Method with Atomic Force Microscope Tip",
    SPIE’s 24th International Symposium on Microlithography, Santa Clara, California, Technical Program and Abstract digest, 3677-60 p180-181 (1999). Proc. SPIE, Microlithography, 3677, San Jose, p565-p573 (1999).
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１９９８年

２件

  • Akira Kawai, Kiyoshi Shimada and Eiichi Andoh,
    "Dependency of Micro Particle Adhesion of Dispersive and Nondispersive Interactions Analyzed by Atomic Force Microscopy",
    Proc. 4th Inter. Symp. Ultra Clean Processing on Silicon Surfaces (UPCSS 98), Ostend, Belgium, Abstract book p84 (1998).
  • Yosihito Tatehaba, Kenichi Kitagawa, Kiyoshi Shimada, Eiichi Ando, Akira Kawai,
    "Removal of PSL particle on substrate in the function water",
    Proceedings of the abstracts of the 28th annual meeting of the fine particle society, Dallas, Texas, (1998).
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１９９７年

４件

  • Akira Kawai and Yoshiaki Kawakami,
    "Adhesion property of sub-micron resist pattern analyzed by direct peeling method with AFM tip",
    The 5th International Colloquim on Scanning Tunneling Microscopy, Kanazawa, Abstract p43 (1997).
  • A. Saito, Y. Misaki, A. Kawai and K. Hamasaki,
    "Fabrication of Superconductor-Constrictions-Superconductor Mesoscopic Devices by Selective Niobium Anodization Process",
    International conference on Solid State and Materials,
    Hamamatsu, Extended abstract, D-6-2, pp252-253 (1997).
  • Yosihito Tatehaba, Kiyoshi Shimada, Eiichi Ando, Akira Kawai,
    "Adhesion Energy of Polystyrene and Substrate in Function Water"; Abstract No.1904, p2194 (1997).
    Proc. 5th Inter. Symp. Cleaning Technology in Semiconductor Device Manufacturing, 97-35 Paris, 560-565 (1997).
  • Akira Kawai, Hiroshi Horiguchi, Yoshihito Tatehaba, Kiyoshi Shimada, Eiichi Andoh,
    "Analysis for Adsorption Behavior of PSL Particle by using Atomic Force Microscopy"; Abstract No. 1924, p2222 (1997).
    Proc. 5th Inter. Symp. Cleaning Technology in Semiconductor Device Manufacturing, 97-35 Paris, 536-543 (1997).
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１９９０～１９９５年

４件

  • Akira Kawai,
    "Measuring the thermal properties of photoresist thin film using an atomic force microscopy",
    International symposium on ultra materials for picotransfer, Makuhari, chiba, Abstract, p192 (1995).
  • Akira Kawai, Hitoshi Nagata, Hiroaki Morimoto and Masasuke Takata,
    "Characterization of surface energy behavior by atomic force microscopy",
    Proceedings of the seventh international conference of surface modification technology VII (SMT VII), Sanjo, Niigata, p343-353 (1993).
  • Akira Kawai, Keiji Fujiwara, Kouichirou Tsujita and Hitoshi Nagata,
    "Characterization of Automatic Overlay Measurement Technique for Sub-Half Micron Devices",
    Proc. SPIE, vol. 1464, Integrated Circuit Metrology, Inspection and Process Control V, San Jose, California, p267-277 (1991).
  • Akira Kawai and Hitoshi Nagata,
    "Adhesion between photoresist and inorganic substrate",
    Digest of papers of 3rd MicroProcess Conference, Chiba, Japan, p68-69 (1990).
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１９８８～１９８９年

３件

  • Hitoshi Nagata and Akira Kawai,
    "Characteristics of Adhesion between Photoresist and Inorganic Substrate"
    Adhesion between photoresist and inorganic substrate, Digest of papers of 2nd MicroProcess Conference, Kobe, Japan (1989).
  • Akira Kawai and Shigeo Uoya,
    "Adhesion characteristics between photoresist and metal substrate",
    International conference of Electrochemical Society, Spring meeting, Atlanta Georgia, Extended abstract, vol.88-1, p171 (1988).
  • Konoe Miura, Tameichi Ochiai, Yasuhiro Kameyama, Chie Kashi, Shigeo Uoya, Masayuki Nakajima, Akira Kawai and Shinji Kishimura,
    "Masking effect and internal CEL new design concepts for a positive working photoresist",
    Proc. SPIE(Society of Photo-Optical Instrumentation Engineers) Santa Clara, 920, p134-141 (1988).