ナノ・マイクロシステム工学研究室 河合研究室

• アクセスマップ
• 著作権

〒940-2188 新潟県長岡市上富岡町1603-1

長岡技術科学大学 電気電子情報工学専攻 河合研究室

E-mail：kawai @ vos.nagaokaut.ac.jp

学生による原著論文

２０１９年

• Tsukasa Sugawara, Isao Hirano, Kensuke Kobayashi, Akira Kawai
  "Application of Polyimide Porous Membrane to Photopolymer Filter"
  J. Photopolymer Science and Technology, 32(6), 791-794 (2019)

２０１８年

• Tsukasa Sugawara, Jun Koshiyama, and Akira Kawai
  "Novel Fabrication of Three-Dimensional Homogeneous Microporous Polyimide Membrane"
  J. Photopolymer Science and Technology, 31(3), 437-440 (2018)
• Tsukasa Sugawara, Hiroyoshi Sago, and Akira Kawai
  "In-Situ Observation of Permeation Behavior and Structural Analysis of Polyimide Membrane with Electrical Properties"
  J. Photopolymer Science and Technology, 31(6), 735-738 (2018)

２０１７年

• Natsumi Yagi and Akira Kawai
  "Three-Dimensional Analysis of Liquid Propagation at Microchannel Junction using ESEM"
  J. Photopolymer Science and Technology, 30(6), 709-714 (2017)
• Katsuaki Yamane and Akira Kawai
  "Application to Artificial Skin of Double Cone Tube Made of Acrylic Resin Formed by Micro Stereolithography"
  J. Photopolymer Science and Technology, 30(3), 345-350 (2017)

２０１６年

• Natsumi Yagi, Akira Kawai
  "Effect of Sub-Pattern on Guiding Liquid Propagation at Microchannel Junction"
  J. Photopolymer Science and Technology, 29(6), 833-834 (2016)
• Hodaka Shirataki, Akira Kawai
  "In-situ Monitoring of TMAH Developer Intrusion into Resist Film by C-V Method"
  J. Photopolymer Science and Technology, 29(6), 817-822 (2016)
• Hiroki Nakano, Kenta Takahashi, Akira Kawai
  "Negative pattern formation in positive resist layer by EB / UV hybrid lithography"
  J. Photopolymer Science and Technology, 29(4), 603-606 (2016) in perss.

２０１４年

• Yako Kunii, Akira Kawai
  "Tactile senses control by contacting a human finger with micro resist pattern arrangements"
  J. Photopolym. Sci. Technol., 27 (6) 691-694(2014)
• Akira Kawai, Shogo Ohtani
  "Frequencydispersion of permittivity of SU-8 resist thin film"
  J. Photopolym. Sci. Technol., 27 (6) 711-712 (2014)

２０１３年

• Yuta Noguchi, Akira Kawai
  “Local Heating System Integrated with Platinum Micro Heater and Photopolymer Microfluidic Channel”
  J. Photopolymer Science and Technology, 26(6), 713-716 (2013).
• Kazutoshi Otsuka, Kenta Takahashi, Akira Kawai
  “Fabrication of Micro Tube Array by Combining Positive with Negative Type Photoresists due to Solubility Difference in Developer”
  J. Photopolymer Science and Technology, 26(6), 717-720 (2013).
• Yosuke Sakurai, Kenta Takahashi, Akira Kawai
  “Liquid Penetration Control of Photoresist/Perfluorosulfonic Acid (PFSA) Double Layer Structure by Hydrophobic Treatment”
  J. Photopolymer Science and Technology, 26(6), 727-732 (2013).
• Yuta Noguchi, Kenta Takahashi, Akira Kawai
  “Micro Pinhole Formation in Photoresist Multilayer Structure controlled with Hydrophilic Treatment”
  J. Photopolymer Science and Technology, 26(6), 739-744 (2013).
• Yosuke Sakurai, Daisuke Tanaka, Shunsuke Ohata,Akira Kawai
  “Fabrication and Durability of Single Chip Micro Direct Methanol Fuel Cell (SC-μDMFC) by Photolithography Process”
  J. Photopolymer Science and Technology, 26(6), 751-756 (2013).

２０１２年

• Yuta Noguchi, Akira Kawai
  “Surface Stability of SU-8 film for Accurate Biopotential Detection”
  J. Photopolymer Science and Technology, 25(6), 719-722 (2012)
• Yosuke Sakurai, Akira Kawai
  “Mechanical Stress Effect on Ionic Conductivity of Perfluorosulfonic Acid (PFSA) Film by Photolithography”
  J. Photopolymer Science and Technology, 25(6), 723-727 (2012).
• Takashi Aiba, Akira Kawai
  “Micro Cantilever Motion in Micro Pattern Peeling by DPAT Method”
  J. Photopolymer Science and Technology, 25(6), 729-733 (2012).
• Satoru Mori, Akira Kawai
  “Interfacial Microstructure of a Double-layer Cu Film Consisting of an Under-layer Deposited on SiO₂ Substrate in Ar-10 vol% O₂ and an Upper-layer Deposited in Pure Ar”
  J. Adhesion Soc. Japan, 48(1), 10-16 (2012).

２０１１年

• Masayoshi Yamada, Akira Kawai
  “Micro Polymer Capsule Constructed with Micro Pillars Formed by Multi Laminating Method”
  J. Photopolymer Science and Technology, 24(6), 647-650 (2011).

２０１０年

• Satoru Mori, Akira Kawai
  “Low-Resistivity and Adhesive Sputter-Deposited Cu-Ca Films with an Intermediate Oxide Layer”
  Jpn. J. Appl. Phys., 49 (2010) p075804-1～8.
• Tetsuya Ono, Akira Kawai
  “Free fall Mechanism of Micro Liquid Droplet”
  J. Photopolymer Science and Technology, 23(3), 363-366 (2010).
• Masayoshi Yamada, Akira Kawai
  “Characterization of Resist Micro Pattern Adhesion by Applying Ultrasonic Vibration”
  J. Photopolymer Science and Technology, 23(3), 435-438 (2010).
• Shunsuke Ohata, Akira Kawai
  “Dielectric Property of Solution Analyzed by using pn-junction Array”
  J. Photopolymer Science and Technology, 23(3), 367-370 (2010).
• Junji Miyazaki, Nobuhito Toyama, Akira Kawai
  “Double Patterning Analysis Method by Emulation using a Double-Exposure Technique”
  Jpn. J. Appl. Phys., 49 (2010) p035201-1～6.
• 山田昌佳、河合　晃、大澤義征、宝泉俊寛
  “超音波プローブ振動法によるはんだバンプの付着性解析”
  Microjoining and Assembly Technology in Electronics (Mate), 93-98 (2010)

２００９年

• Junji Miyazaki, Akira Kawai
  “Fidelity of Mask Shape and Use of a Correction Method in Anisotropic Si Wet Etching”
  J. Photopolymer Science and Technology, 22(6), 731-735 (2009).
• Akihiro Takano, Akira Kawai
  “Analysis of self-standing structure composed by thick resist layer”
  J. Photopolymer Science and Technology, 22(5), 561-564 (2009).
• Hiroki Sasazaki, Akira Kawai
  “Dielectric dispersion analysis of resist layer”
  J. Photopolymer Science and Technology, 22(3), 317-320 (2009).
• Junji Miyazaki, Akira Kawai
  “Formation Mechanism of Micro Defect in Anisotropic Etching Analyzed by using Quasi-defect Pattern”
  J. Photopolymer Science and Technology, 22(3), 313-316 (2009).
• Junji Miyazaki, Akira Kawai
  “Characterization of photomask substrate in optical lithography”
  J. Photopolymer Science and Technology, 22(5), 555-559 (2009).

２００８年

• Daisuke Tanaka, Akira Kawai
  “Flowing control of micro bubbles in DFR micro fluidic channel formed on metal /insulator composite substrate”
  J. Photopolymer Science and Technology, 21(1), 63-68 (2008).
• Takashi Yamaji, Akira Kawai
  “Non-contact deformation of resist micro pattern due to van der Waals Interaction”
  J. Photopolymer Science and Technology, 21(1), 89-94 (2008).

２００７年

• Masaki Yamanaka, Akira Kawai
  “Analysis of micro meniscus shape by light scattering”
  J. Photopolymer Science and Technology, 20(6), 781-782 (2007).
• Kenta Suzuki, Akira Kawai
  “Micro bubbles formed on ArF excimer resist surface detected by tip scanning method” J. Photopolymer Science and Technology, 20(6), 805-806 (2007).
• Shingo Kuroda, Tomohiro Goto, Osamu Tamada, Masakazu Sanada, Akira Kawai
  “Analysis of interface condition between BARC and resist film by FT-IR/ATR”
  J. Photopolymer Science and Technology, 20(6), 807-808 (2007).
• Kazutoshi Kurano, Takahiro Kishioka, Yoshiomi Hiroi, Takuya Ohashi, Akira Kawai
  “Peeling analysis of ArF resist pattern on BARC by using AFM”
  J. Photopolymer Science and Technology, 20(6), 825-826 (2007).
• Kazutoshi Kurano, Takahiro Kishioka, Yoshiomi Hiroi, Takuya Ohashi, Akira Kawai
  “Deformation analysis of ArF resist pattern by using AFM”
  J. Photopolymer Science and Technology, 20(6), 827-828 (2007).
• Harumitsu Kubota, Akira Kawai
  “Native oxide growth on Si(100) surface in liquid environment”
  J. Photopolymer Science and Technology, 20(6), 823-824 (2007).

２００６年

• Takayoshi Niiyama, Akira Kawai
  “Micro wetting system by controlling pinning and capillary forces”
  Microelectronic Engineering, 83, 1280-1283 (2006).
• 安江孝夫、河合 晃
  “走査型プローブ顕微鏡によるシリコン酸化膜の経時絶縁破壊特性”
  日本表面科学会誌、27 (4) 49-54 (2006)
• Mitsuru Sato and Akira Kawai
  “Topcoat characterization for immersion lithography by fluoric acid etching on silicon substrate”
  J. Photopolymer Sci. Technol., 19(5), 601-611 (2006).
• Takayoshi Niiyama and Akira Kawai
  “Formation factors of watermark for immersion lithography”
  Jpn. J. Appl. Phys. 45, 5383-5387 (2006).

２００５年

• Atsushi Ishikawa, Akira Kawai
  “Condensation of Nano-Size Polymer Aggregates by Spin Drying”
  J. Adhesion and Interface, vol.6 (1) 7-10 (2005).
• Takayoshi Niiyama, Akira Kawai
  “Interaction analysis of DI-water / Air / ArF resist system using atomic force microscope”
  J. Photopolymer Sci. Technol., 18(3), 373-380 (2005).

２００４年

• Takayoshi Niiyama and Akira Kawai
  “Interaction force analysis of resist film surface in water vapor”
  J. Photopolymer Sci. Technol., 17(3), 453-456 (2004).
• Atsushi Ishikawa, Makoto Sakata and Akira Kawai
  “Meniscus analysis in micro gap during liquid drying process”
  J. Photopolymer Sci. Technol., 17(3), 457-460 (2004).
• Akira Kawai ,Masahito Hirano and Takayoshi Niiyama
  “Analysis for drying behavior of rinse water depended on resist pattern arrangement”
  J. Photopolymer Sci. Technol., 17(3), 461-464 (2004).
• Atsushi Ishikawa, Takashi Tanji and Akira Kawai
  “Cohesion property of polymer aggregate depending on hardening treatment”
  J. Photopolymer Sci. Technol., 17(1), 99-102 (2004).
• Hotaka Endo and Akira Kawai
  “Micro bubbles captured at micro defect on resist film”
  J. Photopolymer Sci. Technol., 17(1), 105-106 (2004).
• Masaki Yamanaka, Akira Okada and Akira Kawai
  “Pinning effect of microliquid drop on geometrical complex substrates composed with different surface energy materials”
  J. Vac. Sci. & Technol. B22(6), Nov/Dec 3525-3527 (2004).
• Atsushi Ishikawa, Takashi Tanji, Akira Kawai
  “Determination of Young's modulus of polymer aggregate based on Hertz theory”
  J. Photopolymer Sci. Technol., 17(5), 715-718 (2004).
• Hotaka Endo, Akira Kawai
  “Adhesion mechanism of micro bubbles on ArF and F₂ excimer resists”
  J. Photopolymer Sci. Technol., 17(5), 713-714 (2004).

２００３年

• Daisuke Inoue, Akira Kawai
  “Peeling Analysis of Resist line Pattern of 170nm Width Due To Crack Formation by using Atomic Force Microscope Tip”
  Surface and Coating Technology, 169-170, pp.311-315 (2003).
• Masahito Hirano, Akira Kawai
  “Adhesion of AFM tip to resist surface due to Laplace force”
  J. Photopolymer Sci. Technol., 16(5), 663-664 (2003).
• Takayoshi Niiyama, Yuji Sawanaga, Akira Kawai
  “Determination of electrified area formed by AFM lithography”
  J. Photopolymer Sci. Technol., 16(5), 661-662 (2003).

２００１年

• 原　朋敬、小泉延恵、河合　晃
  “Glass／レジスト／Cu／Al／Glass多層構造の破壊特性解析”
  日本接着学会誌、37, 303-308 (2001).
• 阿部貴人、河合　晃
  “原子間力顕微鏡(AFM)を用いた線幅60nmのラインレジストパターンの弾性解析”
  日本接着学会誌、37, 353-357 (2001).
• 磯部　亮、河合　晃
  “微細周期パターン上へのプラズマ重合膜の堆積特性”
  日本接着学会誌、37, 433-436 (2001).

２０００年

• 森池教夫、河合　晃
  “原子間力顕微鏡を用いた一括破壊試験法による有機ドットパターンの付着挙動解析”
  日本接着学会誌、36, 295-301 (2000).
• 森池教夫、河合　晃
  “原子間力顕微鏡を用いた微細レジストドットパターンの疲労解析”
  日本接着学会誌、36, 404-407 (2000).

１９９８年

• 堀口博司、河合　晃
  “AFM探針とポリスチレンラテックス（直径42nm～1μm）凝集粒子間の付着力解析　－DMT理論に基づく微粒子系の相互作用力の補正式－”
  日本表面科学会誌、19, 491-497 (1998).

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